Algorithms of Topology Transformation of Submicron Very Large-Scale Integration Circuits

Algorithms of topology transformation of submicron VLSIC are described which are destined for application in some classes of complex-functional units designed for the following fabrication according to technology of double photomask and satisfying conditions for reproducing the specified topology by using the double photomask technology. It is shown that for solving the problem of design decision making, it is necessary to use methods of settling technical conflicts.