Polynomial Model of Chemical-Mechanical Planarization in Production of Sub-Micrometer VLSIC
| Authors: Amirkhanov A.V. , Gladkikh A.A. , Makarchuk V.V. , Pshennikov A.G. , Shakhnov V.A. | Published: 09.09.2013 |
| Published in issue: #2(87)/2012 | |
| DOI: | |
| Category: Design and technology | |
| Keywords: chemical-mechanical planarization, crystal, interlayer insulation, multilevel metallization, planarization range, yield, topology, convolution, polynomial | |
Peculiarities of the technological operation of chemical-mechanical planarization during the formation of interlayer insulation in VLSIC are considered. The model of chemical-mechanical planarization based on the transformed Preston equation and the model taking into account the timedependence of the planarization rate are analyzed. A polynomial model of chemical-mechanical planarization is offered. The results of simulations using the models under consideration are compared.